Curing and passivation of spin on glasses by a pla

专利名称：Curing and passivation of spin on glasses by

a plasma process wherein an externalpolarization field is applied to the substrate

发明人：Luc M. Ouellet申请号：US07/794789申请日：19911119公开号：US05270267A公开日：19931214

摘要：A method of producing insulating layers over a semiconductor substratecomprising spinning a film of spin-on-glass (SOG) over a semiconductor substrate,precuring the film of SOG at an elevated temperature sufficient to remove the bulk ofsolvent and curing the film of SOG in a plasma in a plasma reactor of a type exhibiting aself-biased R.sub.F discharge adjacent the SOG for a period of time sufficient to excludethe bulk of SiOH, organic volatiles and H.sub.2 O from the layer.

申请人：MITEL CORPORATION

代理机构：Laff, Whitesel, Conte & Saret

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