专利名称：SPUTTERING DEVICE
发明人：BARTOLOMEI, LEROY, ALBERT,READ,
THOMAS,SHEVLIN, CRAIG
申请号：EP96913025申请日：19960423公开号：EP0823944A4公开日：20000920
摘要：A method for reactive sputter coating in a chamber (10) in which largesubstrates (3) to be coated are transported past one or more coating stations (8). Thestations (8) are comprised of at least one sputtering target (6) and at least one adjacentplasma generator (7). In the practice of this invention the sputtering and reaction zones(9) within the chamber (10) are indistinguishable.
申请人：DEPOSITION SCIENCES, INC.
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