专利名称：Method and apparatus for cleaning plate发明人：村田 秀之,千手 康弘,大塚 俊一申请号：JP2017228960申请日：20171129公开号：JP2019098550A公开日：20190624
专利附图：
摘要：Subject About plate cleaning for performing reversal offset printingNon water-soluble nanoparticle dispersed ink attached to the removal convex plateWithout using alarge amount of cleaning liquid or organic solventIn addition, without causing wiping offoreign substancesMainly, washing is done as a main cleaning means, and washing isdone.Residual ink due to poor cleaningCleaning method with low environmental load bysuppressing foreign body adhesionAnd cleaning apparatus.Thus, the printed matterhaving high resolution is provided.Solution The non water-soluble nanoparticle dispersedink used in the reversal offset printing method is applied to the removal convex plate
adhered to the removed convex plate or immersed in the release liquid, and thensprayed or removed after the water that can contain a water-soluble organic solvent inthe removal convex plate The water containing the water-soluble organic solventremaining on the removed convex plate is removed. Diagram
申请人：ＤＩＣ株式会社
地址：東京都板橋区坂下３丁目３５番５８号
国籍：JP
代理人：小川 眞治,岩本 明洋,大野 孝幸,根岸 真
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