Arrangement for monitoring the emission wavelength

专利名称：Arrangement for monitoring the emission

wavelength of a laser source

发明人：Daoning Su申请号：US10348282申请日：20030121

公开号：US20030142904A1公开日：20030731

专利附图：

摘要：An arrangement for monitoring the emission wavelength of a laser source ()emitting a main radiation beam to be launched into an optical waveguide (F) includes awavelength selective photosensitive element () adapted to be exposed to the radiation

beam to generate an output signal () indicative of the wavelength of the radiation. Thearrangement comprises an optical system () defining a beam propagation path for theradiation beam towards the waveguide (F). The wavelength selective photosensitiveelement () is arranged at a marginal position of the beam, to collect at least a

corresponding marginal portion of the radiation beam, whereby the signal () indicative ofthe wavelength of the radiation is generated from said marginal portion of the radiationbeam in the optical system ().

申请人：SU DAONING

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