专利名称：Apparatus and method for maskless
lithography
发明人：Allenspach, Rolf,Marx, Gebhard,Riess, Walter申请号：EP04405446.8申请日：20040713公开号：EP1617290A1公开日：20060118
专利附图：
摘要：The present invention is related to an apparatus and method for masklesslithography. The apparatus comprises an electron accelerating chamber (10) foraccelerating electrons towards a support (12) on which a substrate (15) is mountable; a
photon switching unit (20,21); and an electron emission layer (22) on the photon switchingunit for outcoupling the electrons into the chamber. The photon switching unit with theelectron emission layer is disposed opposite to the support and outcoupled electronsare directly acceleratable towards the support.
申请人：International Business Machines Corporation
地址：New Orchard Road Armonk, NY 10504 US
国籍：US
代理机构：Kretschmer, Thomas
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